Leica EM ACE600 Sputter-Coater
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Contact |
Tel. 0721 608-48682, -46507, -45264 (jonas kaltenbach ∂does-not-exist.kit edu) |
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Vacuum |
≤ 2×10-6 mbar |
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Evaporation source |
Carbon thread evaporation |
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Sputter targets |
Pt, Au, Ag, Ir, W, Cr, Pd |
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Changing mechanism |
Ventilation-free changeover between vapor deposition and sputtering head |
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Stage |
Automated, rotating |
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Tilt angle of stage |
± 60 ° |
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Working distance |
30 - 100 mm |
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Coating thickness measurement |
Quartz crystal |
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Coating thickness |
Up to 1000 nm (common use 10 nm) |
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Coating time |
1 - 1800 s |
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Vacuum system |
Oil-free, 67 l/s Turbomolecular drag pump with diaphragm roughing pump |
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Process gas |
Ar |